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AlN Target

Purity: 99.5% min.


Aluminum nitride sputtering targets are used for innovative applications in rapidly growing industries such as the solar and automotive industries, LED lighting technology, mechanical engineering and industrial technology.


Density Shapes Sizes Surface Condition
3.2g/cm³ Round, Square or Customized Thickness: 3mm min. Ground


Processing Method Sintered, HP & Machining
Processing Service Bonding Indium or Elastomer