| Purity: 99.99% min. |
Aluminum oxide sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc..
| Density | Shapes | Sizes | Surface Condition |
| 3.5-3.9g/cm³ | Round, Square or Customized | Thickness: 3mm min. | Ground |
| Processing Method | Sintered, HP & Machining |
| Processing Service | Bonding： Indium or Elastomer |