| Purity:99.9% min. |
Chromium nitride sputtering target, used for sputtering deposition of thin films in semiconductors, displays, magnetic/optical recording & superconductivity industries.
| Density | Shapes | Sizes | Surface Condition |
| 6.1g/cm³ | Round, Square or Customized | Thickness: 3mm min. | Ground |
| Processing Method | Sintered, HP & Machining |
| Processing Service | Bonding： Indium or Elastomer |