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MoSi2 Target

Purity: 99.9% min.


Molybdenum disilicide target is used to make high temperature anti-oxidation films and integrated electrode films in microelectronics and aerospace industry.


Density Shapes Sizes Surface Condition
6.24g/cm³ Round, Square or Customized Thickness: 3mm min. Ground


Processing Method Sintered, HP & Machining
Processing Service Bonding Indium or Elastomer