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As an important source material of
sputtering target, Si is mainly used in plating SiO2 and SiN by the method of
magnetron sputtering. Being an important functional coating material, it has
good hardness, optical and dielectric properties ,also the characteristics of
wear resistant and anticorrosion. Therefore, Si target processes good market
prospect in the fields of optics and microelectronics as the functional
material which drawn international attention.
Nowadays, Si is mainly used in LED transparent conductive glass, architectural
low-e glass and microelectronics industries.
Silicon target is generally classified into 2 types: Monocrystalline and
Polycrystalline.
Resistivity: 0.005-0.02 ohm.cm
1-3 ohm.cm
>10 ohm.cm
Sheet: L320mm,W100mm,T10mm
Tube:ID135mm,Wall T6/8/10mm,L900mm
Disc: Dia.300mm,T10mm(Monocrystalline)
Dia.450mm,12mm(Polycrystalline)