Purity:99.99% min. |
NiO target is used to make thin films for glass, catalysts, batteries and semiconductor devices.
Density | Shapes | Sizes | Surface Condition |
6.6g/cm³ | Round, Square or Customized | Thickness: 3mm min. | Ground |
Processing Method | Sintered, HP & Machining |
Processing Service | Bonding: Indium or Elastomer |